Carbon Tetrafluoride (CF4)

Carbon tetrafluoride, also known as tetrafluoromethane, is a colorless gas at normal temperature and pressure, insoluble in water. CF4 gas is currently the most widely used plasma etching gas in the microelectronics industry. It is also used as a laser gas, cryogenic refrigerant, solvent, lubricant, insulating material, and coolant for infrared detector tubes.
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Technical Parameters

Specification 99.999%
Oxygen+Argon ≤1ppm
Nitrogen ≤4 ppm
Moisture(H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Halocarbynes ≤1 ppm
Total Impurities ≤10 ppm
Carbon tetrafluoride is a halogenated hydrocarbon with the chemical formula CF4. It can be regarded as a halogenated hydrocarbon, halogenated methane, perfluorocarbon, or as an inorganic compound. Carbon tetrafluoride is a colorless and odorless gas, insoluble in water, soluble in benzene and chloroform. Stable under normal temperature and pressure, avoid strong oxidants, flammable or combustible materials. Non-combustible gas, the internal pressure of the container will increase when exposed to high heat, and there is a danger of cracking and explosion. It is chemically stable and non-flammable. Only liquid ammonia-sodium metal reagent can work at room temperature. Carbon tetrafluoride is a gas that causes the greenhouse effect. It is very stable, can stay in the atmosphere for a long time, and is a very powerful greenhouse gas. Carbon tetrafluoride is used in the plasma etching process of various integrated circuits. It is also used as a laser gas, and is used in low-temperature refrigerants, solvents, lubricants, insulating materials, and coolants for infrared detectors. It is the most used plasma etching gas in the microelectronics industry. It is a mixture of tetrafluoromethane high-purity gas and tetrafluoromethane high-purity gas and high-purity oxygen. It can be widely used in silicon, silicon dioxide, silicon nitride, and phosphosilicate glass. The etching of thin film materials such as tungsten and tungsten is also widely used in the surface cleaning of electronic devices, solar cell production, laser technology, low-temperature refrigeration, leak inspection, and detergent in printed circuit production. Used as a low-temperature refrigerant and plasma dry etching technology for integrated circuits. Precautions for storage: Store in a cool, ventilated non-combustible gas warehouse. Keep away from fire and heat sources. The storage temperature should not exceed 30°C. It should be stored separately from easily (combustible) combustibles and oxidants, and avoid mixed storage. The storage area should be equipped with leakage emergency treatment equipment.

Application:

① Refrigerant: Tetrafluoromethane is sometimes used as a low temperature refrigerant.   fdrgr greg ② Etching: It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride. dsgre rgg

Normal package:

Product Carbon Tetrafluoride CF4
Package Size 40Ltr Cylinder 50Ltr Cylinder  
Filling Net Weight/Cyl 30Kgs 38Kgs  
QTY Loaded in 20’Container 250 Cyls 250 Cyls
Total Net Weight 7.5 Tons 9.5 Tons
Cylinder Tare Weight 50Kgs 55Kgs
Valve CGA 580

Advantage:

①High purity, latest facility; ②ISO certificate manufacturer; ③Fast delivery; ④On-line analysis system for quality control in every step; ⑤High requirement and meticulous process for handling cylinder before filling;

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